Technical Brief

Resistance improvement of aluminum surface to corrosion through reactions with fluoride ions

[+] Author and Article Information
Magal Saphier

Chemistry Department, Nuclear Research Centre Negev, Israel. Full Mailing Address: P.O.Box 9001, Beer-Sheva 84190, ISRAEL

Oron Zamir

Department of Nuclear Engineering, Ben-Gurion University of the Negev, Beer-Sheva, Israel. Chemistry Department, Nuclear Research Centre Negev, Israel

Polina Berzansky

Chemistry Department, Ben-Gurion University of the Negev, Beer-Sheva, Israel

Oshra Saphier

Sami Shamoon College of Engineering Beer-Sheva, Israel

Dan Meyerstein

Chemical Sciences Department, Ariel University, Ariel, Israel

1Corresponding author.

ASME doi:10.1115/1.4036432 History: Received June 12, 2016; Revised March 28, 2017


The reaction of fluoride ions with alumina was found to strongly depend on the concentration of fluoride ions in the aqueous solution. At low concentrations ([F-]<0.1M in the case of KF), the aqueous concentration of aluminum ions is relatively high (ICP measurements), and the aluminum oxide dissolves as a fluoride complex. At high concentrations of fluoride ([F-]>0.5M in the case of KF), a new structure is formed on the alumina surface involving fluoride, aluminum, potassium ions (in the case of KF) and oxygen. The structure is characterized by XRD, SEM and EDS. The resulting structure improved the passivation of alumina, the solubility of aluminum ions decreasing compared to the “untreated” alumina. Aluminum surfaces “fluoride treated” showed a better resistance to dissolution in both acidic and basic media

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