Silicon anisotropic etching simulation, based on geometric model or cellular automata (CA) model, is highly time-consuming. In this paper, we propose two parallelization methods for the simulation of the silicon anisotropic etching process with CA models on graphics processing units (GPUs). One is the direct parallelization of the serial CA algorithm, and the other is to use a spatial parallelization strategy where each crystal unit cell is allocated to a thread in GPU. The proposed simulation methods are implemented with the Compute Unified Device Architecture (CUDA) application programming interface. Several computational experiments are taken to analyze the efficiency of the methods.

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