Massively parallel electron beam lithography may be an alternative manufacturing method in semiconductor industry if the issues of the multi electron beam source are addressed. The microcolumns are suitable for the massively parallel electron beam lithography because of their compactness and the ability to achieve high spatial resolution. A new design with varying apertures for our recent nanoscale photoemission source is presented here. Given the easiness of the fabrication of the microcolumn, we optimized the parameters of the design and found that the resolution can be improved by changing the ratio between the diameters of the focus and extractor electrodes.

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