Chromium oxide abrasive has been reported in the literature to provide efficient chemo-mechanical polishing action for silicon nitride ceramic. Since aluminum oxide and chromium oxide abrasives are nearly of the same hardness, magnetic float polishing tests were conducted on silicon nitride balls with these two abrasives to investigate mechanical versus chemo-mechanical aspects of polishing. Tests results show higher removal rates and smoother surface texture (with fewer pits) with chromium oxide abrasive compared to aluminum oxide abrasive. Formation of pits due to brittle fracture seems to be the more predominant mode of material removal with aluminum oxide abrasive than with chromium oxide abrasive. While there may be some mechanical action (abrasion) with chromium oxide abrasive initially, subsequent removal is believed to be due to chemo-mechanical action. This could be due to degeneration of the chromium oxide abrasive (both mechanical and chemical) during polishing. Various hypotheses for the material removal mechanism (both mechanical and chemo-mechanical) were considered. Based on that, the higher removal rates and smoother surface texture on the silicon nitride balls with chromium oxide abrasive in semifinish polishing is interpreted here as possibly due to chemo-mechanical action. Higher chemical stability of aluminum oxide abrasive (compared to chromium oxide abrasive) and the known role of chromium oxide as a catalyst for the oxidation of silicon nitride are some of the reasons attributed for this action.
Issue Section:
Research Papers
1.
Akazawa
M.
Kato
K.
1988
, “Wear Properties of Si3N4 in Rolling-Sliding Contact
,” Wear
, Vol. 124
, pp. 123
–132
.2.
Akazawa
M.
Kato
K.
Umeya
K.
1986
, “Wear Properties of Silicon Nitride in Rolling Contact
,” Wear
, Vol. 110
, pp. 285
–293
.3.
Bifano
T. G.
Dow
T. A.
Scattergood
R. O.
1991
, “Ductile Regime Grinding: A New Technology for Machining Brittle Materials
,” ASME JOURNAL OF TRIBOLOGY
, Vol. 113
, pp. 184
–189
.4.
Childs
T. H. C.
Jones
D. A.
Mahmood
S.
Kato
K.
Zhang
B.
Umehara
N.
1994
a, “Magnetic Fluid Grinding Mechanics
,” Wear
, Vol. 175
, pp. 189
–198
.5.
Childs
T. H. C.
Mahmood
S.
Yoon
H. J.
1994
b, “The Material Removal Mechanism in Magnetic Fluid Grinding of Ceramic Ball Bearings
,” Proc. of the I. Mech. E.
, Vol. 208 B1
, pp. 47
–59
.6.
Danyuluk, S., Park, D. S., and McNallan, M., 1993, “Friction and Wear of Silicon Nitride Exposed to Moisture at High Temperatures,” Friction and Wear of Ceramics, (Ed. S. Jahanmir), Marcel Dekker, New York.
7.
Dong
X.
Jahanmir
S.
1993
, “Wear Transition Diagram of Silicon Nitride
,” Wear
, Vol. 165
, pp. 169
–180
.8.
Fischer
T. E.
Tomizawa
H.
1985
, “Interaction of Tribo-chemistry and Microfracture in the Friction and Wear of Silicon Nitride
,” Wear
, Vol. 105
, pp. 29
–45
.9.
Fischer, T. E., and Mullins, W. M., 1993, “Relation Between Surface Chemistry and Tribology of Ceramics,” in “Friction and Wear of Ceramics,” ed, S. Jahanmir, Marcel Dekker, New York.
10.
Fischer
T. E.
1988
, “Tribochemistry
,” Ann. Rev. Mater. Sci.
, Vol. 18
, pp. 303
–323
.11.
Gee
M. G.
1992
, “The Formation of Glass in the Wear of Reaction-Bonded Silicon Nitride
,” J. Phys. D. App. Phy.
, Vol. 25
, pp. A182–A188
A182–A188
.12.
Heinicke, G., 1984, Tribochemistry, Carl Hanswe Verlag, Munich.
13.
Jahanmir, S., 1993, Friction and Wear of Ceramics, Marcel Dekker, New York.
14.
Jahanmir
S.
Fischer
T. E.
1987
, “Friction and Wear of Silicon Nitride Lubricated by Humid Air, Water, Hexadecane and Hexadecane + 0.5 percent Stearic Acid
,” Trans STLE
, Vol. 31
, 1
pp. 32
–43
.15.
Jahanmir, S., Ives, L. K., Ruff, W. A., and Peterson, M. B., 1992, “Ceramic Machining: Assessment of Current Practice and Research Needs in the United States,” NIST Special Publication No. 834, U.S. Government Printing Office, Washington, D.C.
16.
Kanno
Y.
Suzuki
K.
Kuwahara
Y.
1983
, “NH3 Formation Caused by the Presence of H2O in the Wet Grinding of Silicon Nitride Powder
,” Yogyo-Kyokai-Shi
, Vol. 91
, p. 386
386
.17.
Kapsa
P.
Kanemura
Y.
1988
, “Sliding Damage on Hot-Pressed and Sintered Silicon Nitride Caused by a Diamond Tip Under Controlled Humidity
,” Wear
, Vol. 127
, pp. 65
–83
.18.
Karaki-Doy
T.
1993
, “Study on Mechanism of Mechano-chemical Polishing and its Application—An Instance of Silicon Wafers
,” J. of Saitama Univ.
, Faculty of Education (Mathematical and Natural Science), Vol. 42
(1
), pp. 33
–47
.19.
Kashiwagura
N.
Harada
J.
Ogino
M.
1983
, “Characterization of Mechanochemically Polished (111) Surface of Silicon by Diffuse X-Ray Scattering
,” J. Appl. Phys.
, Vol. 54
, [5
], pp. 2706
–2710
.20.
Kato
K.
1990
, “Tribology of Ceramics
,” Wear
, Vol. 136
, pp. 117
–133
.21.
Kawata
K.
Tani
Y.
1993
, “Development of High-Concentration Lapping Discs with Low Bonding Strength and Their Application to Mirror Finishing of Brittle Materials
,” JSME Int. Journal, Series C
, Vol. 36
, 2
, pp. 264
–270
.22.
Kikuchi
M.
Takahashi
Y.
Suga
T.
Suzuki
S.
Bando
Y.
1992
, “Mechanochemical Polishing of Silicon Carbide Single Crystal with Chromium(III) Oxide Abrasive
,” J. Amer. Ceram. Soc.
, Vol. 75
, 1
, pp. 189
–195
.23.
Kikuchi, M., Takahashi, Y., Suga, T., Suzuki, S., and Yasunaga, N., 1990, “Mechanochemical Polishing of Silicon Carbide,” Proc. Fall Meeting of JSPE, pp. 327–328 (in Japanese).
24.
Kim
S. S.
Kato
K.
Hokkirigawa
K.
Abe
H.
1986
, “Wear Mechanism of Ceramic Materials in Dry Rolling Friction
,” ASME JOURNAL OF TRIBOLOGY
, Vol. 108
Oct., pp. 522
–526
.25.
Namba
Y.
Tsuwa
H.
1978
, “Mechanisms and Some Applications of Ultrafine Finishing
,” Annals of the CIRP
, Vol. 27
/1
, pp. 511
–516
.26.
Namba
Y.
Tsuwa
H.
1977
, “Ultrafine Finishing of Sapphire Single Crystal
,” Annals of the CIRP
, Vol. 26
/1
, p. 325
325
.27.
Raghunandan, M., Umehara, N., Noori-khajavi, N., and Komanduri, R., 1995, “Magnetic Float Polishing of Advanced Ceramics,” accepted for publication. Trans ASME, J. of Eng. for Ind.
28.
Singhal
S. C.
1975
, “Effect of Water Vapor on the Oxidation of Hot-Pressed Silicon Nitride and Silicon Carbide
,” J. Am. Cer. Soc.
, Vol. 58
, p. 17
17
.29.
Subramanian, K., and Ramanath, S., 1992, “Mechanisms of Material Removal in the Grinding of Ceramics,” Proc. of the Symposium on Precision Machining, ASME Publication PED-58.
30.
Suga
T.
Suzuki
S.
Miyazawa
K.
1989
, “Mechanochemical Polishing of Sintered Silicon Nitride
,” J. JSPE
, Vol. 55
, 12
, pp. 2247
–2253
(in Japanese).31.
Sugita
T.
Ueda
K.
Kanemura
Y.
1984
, “Material Removal Mechanism of Silicon Nitride During Rubbing in Water
,” Wear
, Vol. 97
, pp. 1
–8
.32.
Suzuki
K.
Uematsu
T.
Ohashi
H.
Kitajima
K.
Suga
T.
Imanaka
O.
1992
, “Development of a New Mechanochemical Polishing Method with a Polishing Film for Ceramic Round Bar
,” Annals of the CIRP
, Vol. 41
/1
, pp. 339
–342
.33.
Tani
Y.
Kawata
K.
1984
, “Development of High-Efficient Fine Finishing Process Using Magnetic Fluid
,” Annals of CIRP
, Vol. 33
/1
, pp. 217
–220
.34.
Tomizawa
H.
Fischer
T. E.
1986
, “Friction and Wear of Silicon Nitride and Silicon Carbide in Water: Hydrodynamic Lubrication at Low Sliding Speeds Obtained by Tribochemical Wear
,” Trans ASLE
, Vol. 30
, (1
), pp. 41
–46
.35.
Uematsu, T., Suzuki, K., Wu, M. H., Suzuki, K., and Imanaka, O., 1993, “Efficient Mechanochemical Polishing for Silicon Nitride Ceramics,” Machining of Advanced Materials, NIST Special Publication No. 847 (edited by S. Jahanmir) pp. 409–413.
36.
Umehara
N.
Kato
K.
1990
, “Principles of Magnetic Fluid Grinding of Ceramic Balls
,” Applied Electromagnetics in Materials
, Vol. 1
, pp. 37
–43
.37.
Umehara, N., 1988, “Study on Magnetic Fluid Grinding,” Ph.D. thesis, Tohoku University, Sendai, Japan (in Japanese).
38.
Vora
H.
Orent
T. W.
Stokes
R. J.
1982
, “Mechano-Chemical Polishing of Silicon Nitride
,” J. Amer. Ceram. Soc.
, Vol. 65
, 9
, pp. C140–C141
C140–C141
.39.
Vora, H., and Stokes, R. J., 1983, “Study of Mechano-Chemical Machining of Ceramics and the Effect on Thin Film Behavior,” Rept. No. N00014-80-C-0437-2.
40.
Whittledon, E. P., Ives, L. K., and Peterson, M. B., 1993, “Surface Damage and Mechanics of Fretting Wear in Ceramics,” Friction and Wear of Ceramics, Ed. S. Jahanmir, Marcel Dekker, New York.
41.
Xu
H. K. K.
Jahanmir
S.
1994
, “Simple Technique for Observing Subsurface Damage in Machining Ceramics
,” J. Amer. Cer. Soc.
, Vol. 77
[5
], pp. 1388
–90
.42.
Yasunaga, N., Tarumi, N., Obara, A., and Imanaka, O., 1979, “Mechanism and Application of the Mechanochemical Polishing Method Using Soft Powder,” Science of Ceramic Machining and Surface Finishing II, ed. B. J. Hockey, and R. W. Rice, NBS Special Publication No. 562, p. 171.
43.
Yasunaga
N.
Obara
A.
Imanaka
O.
1978
, “Study of Mechanochemical Effect on Wear and Its Application to Surface Finishing
,” J. of JSPE
, Vol. 44
, pp. 77
–83
(in Japanese).44.
Yasunaga
N.
Obara
A.
Tarumi
N.
1977
, “Study of Mechanochemical Effect on Wear and Its Application to Surface Finishing
,” Res. Electrotech. Lab
, Vol. 776
, pp. 50
–134
(in Japanese).45.
Yoshikawa
H.
1967
, “Brittle-Ductile Behavior of Crystal Surface in Finishing
,” J. Japan Society for Precision Engineering (JSPE)
, Vol. 35
, (10
) Oct, pp. 662
–667
(in Japanese).
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