The interface between hard disk and slider involves mechanical and tribochemical processes between the hard carbon overcoat of the disk, the lubricant, and the carbon coated or uncoated slider surface. These processes have been studied by two related X-ray techniques—Near Edge X-ray Absorption Fine Structure (NEXAFS) spectroscopy and Photoemission Electron Microscopy (PEEM) using X-rays. NEXAFS allows studying the elemented composition and chemical bonding in a material, whereas PEEM combines this ability with imaging of the sample. Lubricated and unlubricated disks were worn under various conditions using carbon coated and uncoated sliders. The wear tracks on the hard disks were investigated using PEEM to find chemical and elemental changes caused by the wear. Local NEXAFS spectra taken in wear tracks using the PEEM microscope show no chemical changes on unlubricated disks, just a reduction of the hard carbon overcoat thickness. On lubricated disks remarkable chemical modifications of the lubricants caused by the wear are observed if the disks failed the wear tests. The chemical changes are manifested in a formation of various new carbon-oxygen (mostly carboxylic) bonds in the wear tracks and in a strong reduction of the amount of fluorine and carbon. The chemical modifications were only found inside the wear tracks and are clearly caused by the wear. It was found that lubricant degradation is not solely a mechanical process of molecule scission but accompanied by oxidation reactions. The chemical changes were strongly correlated to the tribological behavior of the disks: the worse the disks performed in the wear tests, the stronger were the chemical modifications.
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October 1999
Research Papers
Study of Tribochemical Processes on Hard Disks Using Photoemission Electron Microscopy
Simone Anders,
Simone Anders
Advanced Light Source, Ernest Orlando Lawrence Berkeley National Laboratory, University of California, Berkeley, CA 94720
SAnders@LBL.GOV
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Thomas Stammler,
Thomas Stammler
Advanced Light Source, Ernest Orlando Lawrence Berkeley National Laboratory, University of California, Berkeley, CA 94720
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Walton Fong,
Walton Fong
Computer Mechanics Laboratory, Mechanical Engineering Department, University of California, Berkeley, CA 94720
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Chao-Yuan Chen,
Chao-Yuan Chen
Computer Mechanics Laboratory, Mechanical Engineering Department, University of California, Berkeley, CA 94720
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David B. Bogy,
David B. Bogy
Computer Mechanics Laboratory, Mechanical Engineering Department, University of California, Berkeley, CA 94720
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C. Singh Bhatia,
C. Singh Bhatia
SSD/IBM, 5600 Cottle Road, San Jose, CA 95193
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Joachim Sto¨hr
Joachim Sto¨hr
IBM Research Division, Almaden Research Center, 650 Harry Road, San Jose, CA 95120
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Simone Anders
Advanced Light Source, Ernest Orlando Lawrence Berkeley National Laboratory, University of California, Berkeley, CA 94720
SAnders@LBL.GOV
Thomas Stammler
Advanced Light Source, Ernest Orlando Lawrence Berkeley National Laboratory, University of California, Berkeley, CA 94720
Walton Fong
Computer Mechanics Laboratory, Mechanical Engineering Department, University of California, Berkeley, CA 94720
Chao-Yuan Chen
Computer Mechanics Laboratory, Mechanical Engineering Department, University of California, Berkeley, CA 94720
David B. Bogy
Computer Mechanics Laboratory, Mechanical Engineering Department, University of California, Berkeley, CA 94720
C. Singh Bhatia
SSD/IBM, 5600 Cottle Road, San Jose, CA 95193
Joachim Sto¨hr
IBM Research Division, Almaden Research Center, 650 Harry Road, San Jose, CA 95120
J. Tribol. Oct 1999, 121(4): 961-967 (7 pages)
Published Online: October 1, 1999
Article history
Received:
December 8, 1998
Revised:
May 11, 1999
Online:
January 24, 2008
Citation
Anders, S., Stammler, T., Fong, W., Chen, C., Bogy, D. B., Bhatia, C. S., and Sto¨hr, J. (October 1, 1999). "Study of Tribochemical Processes on Hard Disks Using Photoemission Electron Microscopy." ASME. J. Tribol. October 1999; 121(4): 961–967. https://doi.org/10.1115/1.2834162
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